Without it, you might be missing shots or worse, wounding animals without a clean kill. Patterning not only improves your ...
As semiconductor devices become more complex, so do the methods for patterning them. Ever-smaller features at each new node require continuous advancements in photolithography techniques and ...
Several fab tool vendors are rolling out the next wave of self-aligned patterning technologies amid the shift toward new devices at 10/7nm and beyond. Applied Materials, Lam Research and TEL are ...
Self-aligned lithographic process techniques are playing an increasingly important role in advanced technology nodes. Even with the growing use of extreme ultraviolet (EUV) lithography, ...
TOKYO--(BUSINESS WIRE)--Nikon Corporation has announced release of the NSR-S622D ArF immersion scanner to deliver world-class overlay and ultra-high productivity for the most demanding multiple ...
Applied Materials unveiled a new technology to complement ASML's EUV equipment, helping chipmakers remove the need for multiple patterning and creating economic and environmental benefits. Save my ...
Veldhoven, the Netherlands. ASML has announced the first shipment of its new TWINSCAN NXT:1980Di immersion lithography system to support increasingly demanding multiple-patterning performance ...