This release is available in German. Smaller, even smaller, tiny. Miniaturization in chip manufacture is progressing at an impressive pace. Researchers continue to push the physical limits of ...

A new ultraviolet laser source pushes maskless lithography closer to mainstream use in advanced semiconductor packaging by ...

Intel has made significant strides in implementing High-NA EUV lithography by installing two High-NA litho machines, developing custom reticles as well as all-new optical proximity correction, and ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

Photronics Inc. today announced its Sub-Wavelength Reticle Solutions phase shift photomasks have been used to demonstrate the production of sub-100nm features using KrF (248nm) exposure technology.

The global market for EUV mask blanks was valued at USD 591 million in 2024, and is projected to reach a revised size of USD 1,360 million by 2031, growing at a CAGR of 12.2% during the forecast ...

Research and innovation hub imec has produced patterned structures obtained after exposure with the 0.55NA EUV scanner in the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands.

Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...

What is the Market Size of EUV Mask Blanks? BANGALORE, India, Dec. 18, 2025 /PRNewswire/ -- The global market for EUV Mask Blanks was valued at USD 591 Million in the year 2024 and is projected to ...