There is a new type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below. Professor Tsumoru Shintake ...

US startup aims to develop free-electron lasers directly emitting EUV light, in place of today’s laser-driven plasma systems. xLight, a US startup aiming to commercialize particle accelerator driven ...

Intel announced that it had installed ASML's Twinscan EXE:5200B, the industry's first High-NA lithography tool with 0.55 numerical aperture projection optics made for commercial chip production. The ...

Startup Substrate is building next-generation semiconductor fabs using advanced X-ray lithography. This goes beyond extreme ...

Craig Child, who also worked at GlobalFoundries, named director of the CHIPS for America Extreme Ultraviolet Accelerator at Albany Nanotech Craig Child will be the first-ever director at the EUV ...

The semiconductor industry is in a high-stakes race, with artificial intelligence (AI) igniting a global battle for technological supremacy. For a lot of investors, picking the ultimate winner among ...

The Institute of Physics of Microstructures of the Russian Academy of Sciences (IPM RAS) has recently announced a long-term roadmap for the development of an extreme ultraviolet (EUV) lithography ...

Professor Tsumoru Shintake of the Okinawa Institute of Science and Technology (OIST) has proposed an extreme ultraviolet (EUV) lithography technology that he claims is superior to the method currently ...

Lithography, once the exclusive domain of artists and printmakers, also lies at the heart of integrated circuit (IC) production. The process of shining light on a substrate through a photomask to ...

Extreme Ultraviolet (EUV) lithography is a critical technology for manufacturing semiconductor chips smaller than 7 nanometers. For years, Dutch company ASML has maintained a global monopoly on EUV ...