As the unstoppable progression of Moore’s law has driven the semiconductor technology roadmap farther and farther below 1 µm, a steady stream of engineering marvels has been required to produce ...
The big joke about extreme ultraviolet (EUV) technology is that it takes seven trucks to deliver the mammoth tools compared to one for other advanced lithography tools — but actually, this is no joke.
In the creative, or desperate, rush to find ways to pattern 10 nm node using double patterning immersion 193nm lithography, a designer from ARM is left “crying in his beer” at the consequent design ...
SAN JOSE, Calif. — Immersion lithography could be late to the market, forcing chip makers to consider 193-nm “dry” and double-exposure techniques for chip production at the 45-nm node and beyond, ...
Scanner resolution improvements have diminished since the 193-nm wavelength became commonplace. Today’s technologies are sufficient for 28-nm IC designs using immersion, but not beyond without ...
BELMONT, Calif.--(BUSINESS WIRE)--Nikon Corporation has announced they will provide an immersion scanner for Double Patterning, based on the successful NSR-S610C platform, to their customers in the ...
In the famous double-slit experiment, an interference pattern consisting of dark and bright bands emerges when a beam of light hits two narrow slits. The same effect has also been seen with particles ...
Many foreign exchange (forex) traders learning about technical analysis and how to apply it in their currency trading strategy might wonder what is a double-top chart pattern. This bearish chart ...
Applied Materials, Inc. (AMAT), a semiconductor equipment manufacturer (“semi cap”), announced Centura Sculpta last week. According to the company, this tool will help semiconductor manufacturers ...
Michael White, director of product marketing, Calibre Physical Verification products, Mentor Graphics At the rate that new technology nodes keep racing by, it sure feels like we’re speeding down the ...
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