The study of slurry flow dynamics in horizontal pipelines is critical for optimising industrial transport processes, where a mixture of finely dispersed solid particles and carrier fluids is conveyed ...

Effective fabrication of complex, high performance semiconductor devices is highly dependent on the use of chemical mechanical planarization (CMP). This process is used to planarize the wafer surface ...

In semiconductor manufacturing, a process called chemical mechanical planarization (CMP) is used for polishing wafer surfaces. CMP uses a slurry that contains both functional chemicals and ...

Chipmakers are relying on machine learning for electroplating and wafer cleaning at leading-edge process nodes, augmenting traditional fault detection/classification and statistical process control in ...

When we refer to surface charge analysis, we consider the charge at the interface between a material and a surrounding aqueous solution. With respect to the semiconductor field, knowing the charge at ...